| Ou KL |
------>authors3_c=None ------>paper_class1=1 ------>Impact_Factor=1.514 ------>paper_class3=2 ------>paper_class2=1 ------>vol=77 ------>confirm_bywho=chetong ------>insert_bywho=chetong ------>Jurnal_Rank=18.2 ------>authors4_c=None ------>comm_author= ------>patent_EDate=None ------>authors5_c=None ------>publish_day=None ------>paper_class2Letter=None ------>page2=192 ------>medlineContent= ------>unit=F0000 ------>insert_date=20060206 ------>iam=5 ------>update_date=None ------>author=??? ------>change_event=4 ------>ISSN=None ------>authors_c=None ------>score=-10000 ------>journal_name=Microelectronic Engineering. ------>paper_name=Interfacial reactions and electrical properties of hafnium-based thin films in Cu/barrier/n+-p junction diodes. ------>confirm_date=20060206 ------>tch_id=072002 ------>pmid=no found ------>page1=184 ------>fullAbstract=no found ------>tmu_sno=None ------>sno=12525 ------>authors2=Tsai MH ------>authors3=Huang HM ------>authors4=Chiou SY ------>authors5=Lin CT ------>authors6=Lee SY ------>authors6_c=None ------>authors=Ou KL ------>delete_flag=0 ------>SCI_JNo=None ------>authors2_c=None ------>publish_area=0 ------>updateTitle=no found ------>language=2 ------>check_flag=None ------>submit_date=None ------>country=None ------>no= ------>patent_SDate=None ------>update_bywho=None ------>publish_year=2005 ------>submit_flag=None ------>publish_month=None |